INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "WIRING STRUCTURE, PRODUCTION METHOD FOR WIRING STRUCTURE AND SEMICONDUCTOR ELEMENT"

GENEVA, Feb. 17 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2025/027694) for "WIRING STRUCTURE, PRODUCTION METHOD FOR WIRING STRUCTURE, AND SEMICONDUCTOR ELEMENT" on Aug 05, 2025. With publication no. WO/2026/034487, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Invento...