INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "MANUFACTURING CONDITION DESIGN SUPPORT SYSTEM, MANUFACTURING CONDITION DESIGN SUPPORT METHOD, MANUFACTURING CONDITION DESIGN SUPPORT PROGRAM AND MANUFACTURING METHOD"

GENEVA, April 7 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2025/033615) for "MANUFACTURING CONDITION DESIGN SUPPORT SYSTEM, MANUFACTURING CONDITION DESIGN SUPPORT METHOD, MANUFACTURING CONDITION DESIGN SUPPORT PROGRAM, AND MANUFACTURING METHOD" on Sep 24, 2025. With publication no. WO/2026/070865, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system...