GENEVA, Aug. 14 -- NISSAN CHEMICAL CORPORATION filed a patent application (JP2026/001762) for “RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE”. With publication no. WO/2026/168153, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/11
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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