GENEVA, Oct. 5 -- JSR CORPORATION filed a patent application (JP2026/010764) for “RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND”. With publication no. WO/2026/204674, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/004
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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