International Patent: PROCESS CHAMBER FOR THE VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER, DEVICE FOR VAPOR PHASE DEPOSITION, METHOD FOR HEATING SUBSTRATES IN A PROCESS CHAMBER AND METHOD FOR VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER

GENEVA, July 9 -- NEXWAFE GMBH filed a patent application (EP2025/085899) for “PROCESS CHAMBER FOR THE VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER, DEVICE FOR VAPOR PHASE DEPOSITION, METHOD FOR HEATING SUBSTRATES IN A PROCESS CHAMBER AND METHOD FOR VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER”. With publication no. WO/2026/145921, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/24

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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