GENEVA, Aug. 7 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/000979) for “PLASMA PROCESSING SYSTEM AND PRESSURE CONTROL METHOD”. With publication no. WO/2026/163822, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 50/20
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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