International Patent: PLASMA PROCESSING SYSTEM, DEVICE FOR DETECTING END POINT OF PLASMA PROCESSING, AND METHOD FOR DETECTING END POINT OF PLASMA PROCESSING

GENEVA, Aug. 7 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/001021) for “PLASMA PROCESSING SYSTEM, DEVICE FOR DETECTING END POINT OF PLASMA PROCESSING, AND METHOD FOR DETECTING END POINT OF PLASMA PROCESSING”. With publication no. WO/2026/163828, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 50/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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