GENEVA, July 1 -- HITACHI HIGH-TECH CORPORATION filed a patent application (JP2024/044209) for “PLASMA PROCESSING METHOD”. With publication no. WO/2026/126475, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/3065
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....