International Patent: PLASMA PROCESSING BASED ON BIAS SUPPLY REPORTING

GENEVA, June 19 -- AES GLOBAL HOLDINGS PTE. LTD. filed a patent application (US2025/055206) for “PLASMA PROCESSING BASED ON BIAS SUPPLY REPORTING”. With publication no. WO/2026/107110, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/503

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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