INTERNATIONAL PATENT: PIOTECH (SHANGHAI) CO., LTD., 拓荆科技（上海）有限公司 FILES APPLICATION FOR "REACTION PRECURSOR EVAPORATOR AND ATOMIC LAYER DEPOSITION SYSTEM COMPRISING SAME"

Posted On: 2025-07-07

GENEVA, July 7 -- PIOTECH (SHANGHAI) CO., LTD. (Unit 304, Building 10, No. 1211, Hongyin Road, Lin-Gang Special Area of China (shanghai) Pilot Free Trade ZonePudong New Area, Shanghai 201306), 拓荆科技（上海）有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区临港新片区鸿音路1211号10幢304室) filed a patent application (PCT/CN2024/102204) for "REACTION PRECURSOR EVAPORATOR AND ATOMIC LAYER DEPOSITION SYSTEM COMPRISING SAME" on Jun 28, 2024. With publication no. WO/2025/1386...

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INTERNATIONAL PATENT: PIOTECH (SHANGHAI) CO., LTD., 拓荆科技（上海）有限公司 FILES APPLICATION FOR "REACTION PRECURSOR EVAPORATOR AND ATOMIC LAYER DEPOSITION SYSTEM COMPRISING SAME"