INTERNATIONAL PATENT: PICOSUN OY FILES APPLICATION FOR "MANUFACTURING OF SEMICONDUCTOR DEVICES USING AN ETCH STOP LAYER IN FLUORINE-BASED PLASMA ETCHING"

GENEVA, April 28 -- PICOSUN OY (Tietotie 302150 Espoo) filed a patent application (PCT/FI2025/050442) for "MANUFACTURING OF SEMICONDUCTOR DEVICES USING AN ETCH STOP LAYER IN FLUORINE-BASED PLASMA ETCHING" on Aug 22, 2025. With publication no. WO/2026/082997, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIN, Kevin (Tietotie 302150 Espoo), KOSTAMO, Juhana (Tietotie 302150 Espoo)

Abstract: The disclosure concerns a method of producing high aspect ratio (HAR) features for substrates used in semiconductor devices and relat...