GENEVA, July 18 -- RAPIDUS CORPORATION filed a patent application (JP2025/026683) for “PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING DEVICE”. With publication no. WO/2026/150609, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/027
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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