INTERNATIONAL PATENT: NUFLARE TECHNOLOGY, INC., 株式会社ニューフレアテクノロジー FILES APPLICATION FOR "MULTI CHARGED PARTICLE BEAM LITHOGRAPHIC DEVICE AND MULTI CHARGED PARTICLE BEAM LITHOGRAPHIC METHOD"

GENEVA, Feb. 10 -- NUFLARE TECHNOLOGY, INC. (8-1, Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa2358522), 株式会社ニューフレアテクノロジー (神奈川県横浜市磯子区新杉田町８番１) filed a patent application (PCT/JP2025/020447) for "MULTI CHARGED PARTICLE BEAM LITHOGRAPHIC DEVICE AND MULTI CHARGED PARTICLE BEAM LITHOGRAPHIC METHOD" on Jun 05, 2025. With publication no. WO/2026/028596, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classificati...