GENEVA, June 4 -- NOVA MEASURING INSTRUMENTS INC. (3342 Gateway BlvdFremont, California 94538) filed a patent application (PCT/IB2024/061639) for "X-RAY FOCUSING WITH WAVELENGTH SELECTION SYSTEMS FOR SEMICONDUCTOR METROLOGY" on Nov 20, 2024. With publication no. WO/2025/109498, the details related to the patent application was published on May 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SCHUELER, Bruno W. (1067 Merle AvenueSan Jose, California 95125), DELGADO, Gildardo (5945 Linwood CMNLivermore, California 4550)
Abstract:
An x-ray illumination system for use in x-ray based metrol...