GENEVA, Feb. 3 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/025862) for "COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, METHOD FOR MANUFACTURING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Jul 22, 2025. With publication no. WO/2026/023595, the details related to the patent application was published on Jan 29, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the...