GENEVA, May 5 -- NIKON CORPORATION (1-5-20, Nishioi, Shinagawa-ku, Tokyo1408601), 株式会社ニコン (東京都品川区西大井１－５－２０) filed a patent application (PCT/JP2025/033623) for "MASK, MEASUREMENT METHOD, AND EXPOSURE METHOD" on Sep 24, 2025. With publication no. WO/2026/088689, the details related to the patent application was published on Apr 30, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SATO, Kenji (c/o NIKON CORPORATION, 1-5-20, Nishioi, Shinagawa-k...