INTERNATIONAL PATENT: NEXUS1 CO., LTD., 주식회사 넥서스원 FILES APPLICATION FOR "HIGH-SPEED WAFER DEFECT MEASUREMENT SYSTEM HAVING TWIN STAGES AND HIGH-SPEED WAFER DEFECT MEASUREMENT METHOD USING SAME"

GENEVA, Feb. 3 -- NEXUS1 CO., LTD. (161-14 Gwaerangbotong-gil, Jeongnam-myeon,Hwaseong-si,Gyeonggi-do 18516), 주식회사 넥서스원 (경기도화성시정남면 괘랑보통길 161-14) filed a patent application (PCT/KR2024/096265) for "HIGH-SPEED WAFER DEFECT MEASUREMENT SYSTEM HAVING TWIN STAGES AND HIGH-SPEED WAFER DEFECT MEASUREMENT METHOD USING SAME" on Oct 10, 2024. With publication no. WO/2026/023771, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectu...