INTERNATIONAL PATENT: NANYANG TECHNOLOGICAL UNIVERSITY FILES APPLICATION FOR "A METHOD OF FORMING A HIGH-ENTROPY OXIDE NANOSTRUCTURE"

GENEVA, Feb. 10 -- NANYANG TECHNOLOGICAL UNIVERSITY (50 Nanyang AvenueSingapore 639798) filed a patent application (PCT/SG2025/050522) for "A METHOD OF FORMING A HIGH-ENTROPY OXIDE NANOSTRUCTURE" on Aug 01, 2025. With publication no. WO/2026/029709, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HUANG, Yizhong (c/o Nanyang Technological University50 Nanyang AvenueSingapore 639798), LU, Yu (c/o Nanyang Technological University50 Nanyang AvenueSingapore 639798), XIU, Mingzhen (c/o Nanyang Technological University50 Nanyang...