GENEVA, April 8 -- NANI LITHOGRAPHY INC. (3440 Hillview Avenue, Ste. C-300,Palo Alto, CA 94304) filed a patent application (PCT/US2025/047464) for "LITHOGRAPHY MASK METHODS AND COMPOSITION" on Sep 23, 2025. With publication no. WO/2026/072534, the details related to the patent application was published on Apr 02, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): AMIRAV, Lilac (1801 Oakdell DriveMenlo Park, CA 94025)
Abstract: The disclosure relates to photolithography systems, methods and masks for semiconductor fabrication, focusing on overcoming diffraction-limited critical dimensions in op...