GENEVA, July 2 -- KLA CORPORATION filed a patent application (US2025/059076) for “MULTIWAVELENGTH MEASUREMENTS FOR SCANNING OVERLAY METROLOGY”. With publication no. WO/2026/136100, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....