GENEVA, Oct. 30 -- MEIDENSHA CORPORATION filed a patent application (JP2026/010562) for “MONITORING DEVICE AND MONITORING METHOD FOR ROTARY MACHINE”. With publication no. WO/2026/225170, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B23Q 17/09
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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