GENEVA, Sept. 7 -- ASML NETHERLANDS B.V. filed a patent application (EP2026/052228) for “MODEL-BASED AUTOMATIC DEFECT CLASSIFICATION DURING WAFER INSPECTION”. With publication no. WO/2026/180159, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/20
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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