INTERNATIONAL PATENT: MIXX TECHNOLOGIES, INC. FILES APPLICATION FOR "SYSTEM AND METHOD FOR AN EXTENDED BURIED OXIDE LAYER FOR SILICON PHOTONIC INTEGRATED CIRCUITS"

GENEVA, March 31 -- MIXX TECHNOLOGIES, INC. (2055 Gateway Place, Suite 670San Jose, California 95110) filed a patent application (PCT/US2025/047024) for "SYSTEM AND METHOD FOR AN EXTENDED BURIED OXIDE LAYER FOR SILICON PHOTONIC INTEGRATED CIRCUITS" on Sep 18, 2025. With publication no. WO/2026/064541, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SCHAEVITZ, Rebecca Kayla (2055 Gateway Place, Suite 670San Jose, California 95110), RAGHURAMAN, Vivek (2055 Gateway Place, Suite 670San Jose, California 95110)

Abstract: A dev...