INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "PLUG FOR PROTECTION OF BACKSIDE SOURCE FORMATION OF VERTICAL PLANAR MEMORY CELLS"

GENEVA, Feb. 11 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, ID 83716-9632) filed a patent application (PCT/US2025/038951) for "PLUG FOR PROTECTION OF BACKSIDE SOURCE FORMATION OF VERTICAL PLANAR MEMORY CELLS" on Jul 23, 2025. With publication no. WO/2026/030086, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HIGUCHI, Masaaki (8000 S. Federal WayBoise, ID 83716-9632), FUKUZUMI, Yoshiaki (8000 S. Federal WayBoise, ID 83716-9632)

Abstract: Methods, systems, and devices for formation of an apparatus including a pl...