INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "METHODS FOR SELECTIVELY DEPOSITING CARBON ON SUBSTRATES BY ATOMIC LAYER DEPOSITION"

GENEVA, Feb. 11 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/038294) for "METHODS FOR SELECTIVELY DEPOSITING CARBON ON SUBSTRATES BY ATOMIC LAYER DEPOSITION" on Jul 18, 2025. With publication no. WO/2026/030011, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LEHN, Jean-Sebastien Materne (8000 S. Federal WayBoise, Idaho 83716-9632), SUBRAMANIAN, Parameswara (8000 S. Federal WayBoise, Idaho 83716-9632), VARESI, Enrico (8000 S. Federal WayBoise, Idaho 83716-9...