INTERNATIONAL PATENT: MICRON TECHNOLOGY, INC. FILES APPLICATION FOR "DEPOSITING CARBON FILMS USING A SINGLE PRECURSOR"

GENEVA, Feb. 11 -- MICRON TECHNOLOGY, INC. (8000 S. Federal WayBoise, Idaho 83716-9632) filed a patent application (PCT/US2025/039487) for "DEPOSITING CARBON FILMS USING A SINGLE PRECURSOR" on Jul 28, 2025. With publication no. WO/2026/030220, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LEHN, Jean-Sebastien Materne (8000 S. Federal WayBoise, Idaho 83716-9632), VARESI, Enrico (8000 S. Federal WayBoise, Idaho 83716-9632), SUBRAMANIAN, Parameswara (8000 S. Federal WayBoise, Idaho 83716-9632), GOOD, Farrell M. (8000 S. Fe...