International Patent: METHODS OF FORMING FERROELECTRIC DEVICES WITH METAL OXIDE SIDEWALL SPACERS

GENEVA, July 6 -- TOKYO ELECTRON LIMITED filed a patent application (US2025/026994) for “METHODS OF FORMING FERROELECTRIC DEVICES WITH METAL OXIDE SIDEWALL SPACERS”. With publication no. WO/2026/142727, here are the other details related to the patent application:

Kind: Initial Publication without ISR [A2]

IPC: H10B 53/30

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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