International Patent: METHODS FOR OXIDIZING A SUBSTRATE SURFACE USING GAS PHASE OXIDIZING RADICALS

GENEVA, June 19 -- TOKYO ELECTRON LIMITED filed a patent application (US2025/046703) for “METHODS FOR OXIDIZING A SUBSTRATE SURFACE USING GAS PHASE OXIDIZING RADICALS”. With publication no. WO/2026/106698, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/02

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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