GENEVA, July 1 -- INFINEON TECHNOLOGIES LLC filed a patent application (US2025/016078) for “METHOD OF EQUALIZING GATE HEIGHTS IN EMBEDDED NON-VOLATILE MEMORY ON HKMG TECHNOLOGY”. With publication no. WO/2025/235053, here are the other details related to the patent application:
Kind: Corrected version of pamphlet [A9]
IPC: H01B 41/35
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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