GENEVA, Sept. 7 -- DAIKIN INDUSTRIES, LTD. filed a patent application (JP2026/004844) for “METHOD FOR REMOVING H2S FROM GAS COMPOSITION CONTAINING COS AND H2S, ETCHING GAS, AND METHOD FOR MANUFACTURING ETCHING GAS”. With publication no. WO/2026/181711, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B01D 53/04
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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