GENEVA, Aug. 14 -- SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION filed a patent application (KR2026/001478) for “METHOD FOR GENERATING DIGITAL MASK CORRECTION MODEL FOR DLP PROJECTOR FOR 3D PRINTING, AND DIGITAL MASK CORRECTION METHOD AND DIGITAL MASK CORRECTION APPARATUS USING SAME”. With publication no. WO/2026/168842, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B29C 64/393
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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