International Patent: METHOD FOR GENERATING AND AMPLIFYING LASER PULSES, METHOD FOR GENERATING A PLASMA WHICH EMITS SECONDARY RADIATION, METHOD FOR PRODUCING MICROCHIPS OR SEMICONDUCTOR INTERMEDIATE PRODUCTS, AND OPTICAL ASSEMBLY

GENEVA, July 18 -- TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE filed a patent application (EP2026/050315) for “METHOD FOR GENERATING AND AMPLIFYING LASER PULSES, METHOD FOR GENERATING A PLASMA WHICH EMITS SECONDARY RADIATION, METHOD FOR PRODUCING MICROCHIPS OR SEMICONDUCTOR INTERMEDIATE PRODUCTS, AND OPTICAL ASSEMBLY”. With publication no. WO/2026/150003, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01S 3/23

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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