GENEVA, July 27 -- SEMICONDUCTOR ENERGY LABORATORY CO., LTD. filed a patent application (IB2025/058878) for “METHOD FOR FORMING METAL OXIDE LAYER, METAL OXIDE LAYER, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/154307, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/363
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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