International Patent: METHOD FOR CONTROLLING THE SURFACE TEMPERATURE OF A SHIELD PLATE ARRANGED IN THE PROCESS CHAMBER OF A CVD REACTOR

GENEVA, July 27 -- AIXTRON LTD. filed a patent application (EP2026/050696) for “METHOD FOR CONTROLLING THE SURFACE TEMPERATURE OF A SHIELD PLATE ARRANGED IN THE PROCESS CHAMBER OF A CVD REACTOR”. With publication no. WO/2026/153937, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/455

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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