GENEVA, July 27 -- AIXTRON LTD. filed a patent application (EP2026/050943) for “METHOD FOR CONTROLLING RADIAL PROFILES OF THE SURFACE TEMPERATURE OF ELEMENTS IN THE PROCESS CHAMBER OF A CVD REACTOR”. With publication no. WO/2026/154066, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 16/455
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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