GENEVA, Oct. 15 -- ASML NETHERLANDS B.V. filed a patent application (EP2026/057556) for “METHOD AND SYSTEM FOR DETERMINING OPTICAL ABERRATIONS AND LITHOGRAPHIC APPARATUS INCLUDING THE SYSTEM”. With publication no. WO/2026/214961, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....