International Patent: METHOD AND SHELL STRUCTURE FOR REDUCING AN ELECTROMAGNETIC FOOTPRINT OF AN UNMANNED AERIAL VEHICLE

GENEVA, July 1 -- GRAPHMATECH AB filed a patent application (SE2025/010083) for “METHOD AND SHELL STRUCTURE FOR REDUCING AN ELECTROMAGNETIC FOOTPRINT OF AN UNMANNED AERIAL VEHICLE”. With publication no. WO/2026/127806, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: B64U 20/10

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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