International Patent: METHOD AND DEVICE FOR PRODUCING BUBBLE-FREE ULTRAPURE WATER FOR CLEANING SEMICONDUCTOR SUBSTRATES

GENEVA, Sept. 7 -- SILTRONIC AG filed a patent application (EP2026/052787) for “METHOD AND DEVICE FOR PRODUCING BUBBLE-FREE ULTRAPURE WATER FOR CLEANING SEMICONDUCTOR SUBSTRATES”. With publication no. WO/2026/180193, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C02F 1/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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