International Patent: MATERIALS, ARCHITECTURES, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER COMPONENTS

GENEVA, Sept. 24 -- JAISWAL, Supriya filed a patent application (US2025/020703) for “MATERIALS, ARCHITECTURES, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER COMPONENTS”. With publication no. WO/2026/198064, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G02B 1/10

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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