International Patent: MASKLESS PATTERNING EQUIPMENT AND GENERAL-PURPOSE FREE-FORM PATTERN FORMING SYSTEM FOR CREATIVE RESEARCH AND DEVELOPMENT INCLUDING SAME

GENEVA, July 6 -- INDUSTRY ACADEMY COOPERATION FOUNDATION OF SEJONG UNIVERSITY filed a patent application (KR2025/019120) for “MASKLESS PATTERNING EQUIPMENT AND GENERAL-PURPOSE FREE-FORM PATTERN FORMING SYSTEM FOR CREATIVE RESEARCH AND DEVELOPMENT INCLUDING SAME”. With publication no. WO/2026/141977, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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