International Patent: LOW HYDROGEN AND UNIFORM SILICON NITRIDE FILM FOR WAVEGUIDES

GENEVA, Aug. 7 -- APPLIED MATERIALS, INC. filed a patent application (US2026/012486) for “LOW HYDROGEN AND UNIFORM SILICON NITRIDE FILM FOR WAVEGUIDES”. With publication no. WO/2026/164944, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/34

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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