International Patent: LORENTZ ELECTRON MICROSCOPE AND ELECTRON BEAM IMAGE GENERATION METHOD CAPABLE OF GENERATING ELECTRON BEAM IMAGE WITH SUPPRESSED DIFFRACTION CONTRAST

GENEVA, Nov. 6 -- RIKEN filed a patent application (JP2026/014741) for “LORENTZ ELECTRON MICROSCOPE AND ELECTRON BEAM IMAGE GENERATION METHOD CAPABLE OF GENERATING ELECTRON BEAM IMAGE WITH SUPPRESSED DIFFRACTION CONTRAST”. With publication no. WO/2026/230304, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01J 37/22

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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