GENEVA, July 31 -- SHANGHAITECH UNIVERSITY filed a patent application (CN2025/137638) for “LOCALIZED LAVAL NOZZLE HIGH-PRESSURE AIR INTAKE DEVICE SUITABLE FOR NEAR-ATMOSPHERIC-PRESSURE PHOTOELECTRON SPECTROSCOPY AND USE”. With publication no. WO/2026/157509, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01N 23/2273
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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