GENEVA, July 27 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. filed a patent application (JP2026/001114) for “LITHOGRAPHY FILM-FORMING COMPOSITION, RESIST FILM, AND PATTERN FORMING METHOD”. With publication no. WO/2026/155201, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/039
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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