International Patent: LINEARLY GANGED DISPLACEMENT PHASE MODULATOR FOR HIGH POWER LASER PROCESSING

GENEVA, Aug. 31 -- SILICON LIGHT MACHINES CORPORATION filed a patent application (US2026/015716) for “LINEARLY GANGED DISPLACEMENT PHASE MODULATOR FOR HIGH POWER LASER PROCESSING”. With publication no. WO/2026/178160, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G02B 26/06

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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