INTERNATIONAL PATENT: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC FILES APPLICATION FOR "SYSTEMS AND METHODS FOR BIDIRECTIONAL THIN FILM DEPOSITION TO PRODUCE ETCHING MASK FEATURES WITH TAILORABLE SPACING AND DUTY CYCLE"

GENEVA, April 14 -- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (7000 East AvenueLivermore, California 94550) filed a patent application (PCT/US2025/048604) for "SYSTEMS AND METHODS FOR BIDIRECTIONAL THIN FILM DEPOSITION TO PRODUCE ETCHING MASK FEATURES WITH TAILORABLE SPACING AND DUTY CYCLE" on Sep 30, 2025. With publication no. WO/2026/075944, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RAY, Nathan James (c/o Lawrence Livermore National Laboratory7000 East Avenue, P.O. Box 808, L-703Livermore, California 94550), NGUYE...