International Patent: LASER DEVICE FOR GENERATING AN EUV LIGHT-EMITTING PLASMA, EUV BEAM SOURCE, SYSTEM FOR EXPOSING A COMPONENT, METHOD FOR EXPOSING A COMPONENT, METHOD FOR PRODUCING MICROCHIPS OR SEMICONDUCTOR INTERMEDIATE PRODUCTS, AND USE

GENEVA, Oct. 30 -- TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE filed a patent application (EP2026/060798) for “LASER DEVICE FOR GENERATING AN EUV LIGHT-EMITTING PLASMA, EUV BEAM SOURCE, SYSTEM FOR EXPOSING A COMPONENT, METHOD FOR EXPOSING A COMPONENT, METHOD FOR PRODUCING MICROCHIPS OR SEMICONDUCTOR INTERMEDIATE PRODUCTS, AND USE”. With publication no. WO/2026/224046, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G02F 1/37

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....