GENEVA, July 9 -- SHANGHAI LONGWELL M & E CO., LTD. filed a patent application (CN2025/099361) for “LARGE-FLOW-RATE GAS MIXING SYSTEM AND METHOD, AND SEMICONDUCTOR PROCESS DEVICE”. With publication no. WO/2026/143993, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B01F 35/71
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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