INTERNATIONAL PATENT: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE, AMERICAN AIR LIQUIDE, INC. FILES APPLICATION FOR "LOW GWP PLASMA ETCHING PROCESS USING C6F12"

GENEVA, Dec. 2 -- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (75 Quai d'Orsay75007 Paris), AMERICAN AIR LIQUIDE, INC. (4640 Landing ParkwayFremont, CA 94538) filed a patent application (PCT/US2025/030201) for "LOW GWP PLASMA ETCHING PROCESS USING C6F12 " on May 20, 2025. With publication no. WO/2025/245117, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): STAFFORD, Nathan (200 GBC DriveNewark, DE 19702), NGUYEN, Phong (200 GBC DriveNewark, DE 19702)

Abstract: An etching meth...