INTERNATIONAL PATENT: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, 한국화학연구원 FILES APPLICATION FOR "BISMUTH COMPOUND FOR PHOTORESIST, METHOD FOR PRODUCING SAME, COMPOSITION INCLUDING SAME AND PATTERN FORMING METHOD USING SAME"

GENEVA, March 3 -- KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (141, Gajeong-roYuseong-guDaejeon 34114), 한국화학연구원 (대전광역시유성구가정로 141) filed a patent application (PCT/KR2025/012527) for "BISMUTH COMPOUND FOR PHOTORESIST, METHOD FOR PRODUCING SAME, COMPOSITION INCLUDING SAME, AND PATTERN FORMING METHOD USING SAME" on Aug 19, 2025. With publication no. WO/2026/043241, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO)...